发明名称 |
Dual entrance window ion chamber for measuring X-ray exposure |
摘要 |
A dual entrance window ion chamber is provided for purposes of measuring x-ray exposure. The ion chamber includes a housing having a cavity formed therein and which defines an ion chamber. The housing has oppositely disposed first and second openings therein located on opposite sides of the chamber. First and second x-ray entrance windows respectively cover the first and second openings for permitting entrance of x-rays into the chamber. A collector is located in the chamber intermediate the first and second windows for collection of electrons for use in measuring x-ray exposure. The first and second windows are constructed differently from each other such that the first window is optimized so that the ion chamber provides a relatively flat energy response to x-rays over a first x-ray energy range. The second window is optimized so that the ion chamber provides a relatively flat energy response over a second x-ray energy range. The second energy range is of a greater energy level than that of the first energy range.
|
申请公布号 |
US5508526(A) |
申请公布日期 |
1996.04.16 |
申请号 |
US19950382138 |
申请日期 |
1995.02.01 |
申请人 |
KEITHLEY INSTRUMENTS, INC. |
发明人 |
LABB, MICHAEL S. |
分类号 |
G01T1/185;H01J47/02;(IPC1-7):G01T1/185 |
主分类号 |
G01T1/185 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|