发明名称 Dual entrance window ion chamber for measuring X-ray exposure
摘要 A dual entrance window ion chamber is provided for purposes of measuring x-ray exposure. The ion chamber includes a housing having a cavity formed therein and which defines an ion chamber. The housing has oppositely disposed first and second openings therein located on opposite sides of the chamber. First and second x-ray entrance windows respectively cover the first and second openings for permitting entrance of x-rays into the chamber. A collector is located in the chamber intermediate the first and second windows for collection of electrons for use in measuring x-ray exposure. The first and second windows are constructed differently from each other such that the first window is optimized so that the ion chamber provides a relatively flat energy response to x-rays over a first x-ray energy range. The second window is optimized so that the ion chamber provides a relatively flat energy response over a second x-ray energy range. The second energy range is of a greater energy level than that of the first energy range.
申请公布号 US5508526(A) 申请公布日期 1996.04.16
申请号 US19950382138 申请日期 1995.02.01
申请人 KEITHLEY INSTRUMENTS, INC. 发明人 LABB, MICHAEL S.
分类号 G01T1/185;H01J47/02;(IPC1-7):G01T1/185 主分类号 G01T1/185
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