发明名称 |
Method of detecting positional displacement between mask and wafer, and exposure apparatus adopting the method |
摘要 |
A method and apparatus for detecting the relative positional displacement between a mask and a wafer. The mask is provided with a cantilever. The position mark is provided on the wafer so as to face the cantilever. A relative positional displacement between the mask and the wafer is detected from a deformation amount of the cantilever based on a force acting between the position mark and the cantilever upon relative movement of the position mark and the cantilever. |
申请公布号 |
US5508527(A) |
申请公布日期 |
1996.04.16 |
申请号 |
US19940298316 |
申请日期 |
1994.09.01 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KURODA, RYO;MIYAZAKI, TOSHIHIKO;SAKAI, KUNIHIRO;NOSE, HIROYASU;TAKIMOTO, KIYOSHI |
分类号 |
G03F9/00;G01B7/00;G01J1/00;G01Q60/24;H01L21/027;H01L21/68;(IPC1-7):G01J1/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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