| 摘要 |
<p>PURPOSE: To further improve the accuracy of the mask pattern for X-ray exposure by increasing the adhesive strength between an X-ray transmissive supporting film and an X-ray absorptive film with the interposition of a specified first antireflection film. CONSTITUTION: This mask is provided with a silicon frame 5 pierced with a window 7, an X-ray transmissive supporting film 3 supported by the frame 5 and an X-ray absorptive pattern 1 of heavy metal furnished on the supporting film 3. A first antireflection film 2 is provided between the pattern 1 and the supporting film 3 and a second antireflection film 4 on the face of the supporting film 3 in contact with the frame 5. The supporting film 3 and the second antireflection film 4 are formed of a light-element substance and the first antireflection film 2 is formed of the tin oxide film adhesive to the pattern 1 and supporting film 3. Consequently, when the pattern 1 is formed by reactive ion etching, the pattern is not meandered, and the pattern precision is improved.</p> |
