| 摘要 |
PURPOSE: To obtain the subject composition comprising a specific prepolymer and a photochemically acid-generating agent, and capable of giving releaf patterns excellent in heat resistance without deteriorating the sensitivity, because of having the high sensitivity, chemical resistance and heat resistance. CONSTITUTION: This resin composition comprises (A) a prepolymer having vinyl or vinylene groups used as crosslinking points on the side chains and further having functional groups capable of being released to produce hydroxyl groups, and (B) a photochemically acid-generating agent (preferably an onium salt of formula I or II). The component A is preferably the ionic copolymer of a hydroxyl group-protected hydroxyphenylmaleimide derivative of formula III (R<1> is a protecting group capable of being substituted with a hydrogen atom in the presence of an acid catalyst) or a hydroxyl group-protected styrene derivative of formula IV with a monomer having the different kinds of a maleimide group and a vinyl group and represented by formula V. The monomer of formula V is preferably e.g. N-(4-vinylphenyl)maleimide. |
