发明名称 WIRING STRUCTURE AND IT MANUFACTURE
摘要 PURPOSE: To provide a wiring structure which is high in reliability and low in priced by forming a part of the wiring of the wiring layer of the wiring structure with copper and an insulating layer with a first polyimide having a repeated unit expressed by a specified chemical formula to prevent the elution of copper and generating of cracks in the insulating layer. CONSTITUTION: The wiring of a wiring layer is made up of copper at least in part and at least a part of an insulating layer is made up of a first polyimide obtained by thermally hardening the polyimide precursor composition containing at least polyimide precursor and a basic compound. The basic compound is at least one kind of a quadrivalent organic group selected from formula I and formula II. R<1> in formula I is expressed by formula II and R<2> is bivalent organic group containing an aromatic ring. Thereby, the elution of copper and the crack of the insulating layer are prevented and the mechanical characteristic and the boundary adhesive property are enhanced, so that high reliable products may be provided at a low cost.
申请公布号 JPH0897525(A) 申请公布日期 1996.04.12
申请号 JP19950173710 申请日期 1995.07.10
申请人 HITACHI LTD 发明人 TOGAWA HIDEO;OTANI YOSHIHARU;SHOJI FUSAJI;KATAOKA FUMIO;MATSUYAMA HARUHIKO;MATSUZAKI EIJI;SHIGI HIDETAKA;MATSUSHIMA NAOKI;YAMAZAKI TETSUYA;AKAMATSU SHIRO;IKEDA SEIJI
分类号 B32B15/08;B32B27/34;C08G73/10;H05K1/03;H05K3/28;H05K3/46;(IPC1-7):H05K1/03 主分类号 B32B15/08
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