发明名称 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION
摘要 PURPOSE: To provide a photosensitive polyimide resin compsn. excellent in resist characteristics such as sensitivity and having high shelf stability. CONSTITUTION: This photosensitive resin compsn. contains a polyamic acid compd. represented by formula I, a photosensitive aid having a photopolymerizable functional group and a solvent. In the formula I, R<1> is a tetravalent org. group, R<2> is a divalent org. group, (k) is an integer of 5-10,000 and Z is an actinic ray functional group represented by formula II [where each of R<3> -R<7> is a substituent having a photopolymerizable carbon-carbon double bond and (m) is 0 or 1].
申请公布号 JPH0895247(A) 申请公布日期 1996.04.12
申请号 JP19940256222 申请日期 1994.09.26
申请人 NIPPON ZEON CO LTD;FUJITSU LTD 发明人 TANAKA AKIRA;TAZAKI SATOSHI;SAKAMOTO KEI;YONEDA YASUHIRO;YOKOUCHI KISHIO;MIZUTANI DAISUKE;ISHIZUKI YOSHIKATSU
分类号 G03F7/027;G03F7/031;G03F7/038;H01L21/027;H01L21/312;H05K3/06;H05K3/28;(IPC1-7):G03F7/038 主分类号 G03F7/027
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