发明名称 |
PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION |
摘要 |
PURPOSE: To provide a photosensitive polyimide resin compsn. excellent in resist characteristics such as sensitivity and having high shelf stability. CONSTITUTION: This photosensitive resin compsn. contains a polyamic acid compd. represented by formula I, a photosensitive aid having a photopolymerizable functional group and a solvent. In the formula I, R<1> is a tetravalent org. group, R<2> is a divalent org. group, (k) is an integer of 5-10,000 and Z is an actinic ray functional group represented by formula II [where each of R<3> -R<7> is a substituent having a photopolymerizable carbon-carbon double bond and (m) is 0 or 1]. |
申请公布号 |
JPH0895247(A) |
申请公布日期 |
1996.04.12 |
申请号 |
JP19940256222 |
申请日期 |
1994.09.26 |
申请人 |
NIPPON ZEON CO LTD;FUJITSU LTD |
发明人 |
TANAKA AKIRA;TAZAKI SATOSHI;SAKAMOTO KEI;YONEDA YASUHIRO;YOKOUCHI KISHIO;MIZUTANI DAISUKE;ISHIZUKI YOSHIKATSU |
分类号 |
G03F7/027;G03F7/031;G03F7/038;H01L21/027;H01L21/312;H05K3/06;H05K3/28;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|