发明名称 SAMPLE FIXER FOR ELECTRON BEAM LITHOGRAPHY SYSTEM
摘要 <p>PURPOSE: To install it on a stage, keeping the flatness of a sample in highly accurate condition without being influenced by the distortion of a frame entailed by the installation to the stage. CONSTITUTION: A sample W is given highly accurate flatness by at least four flatness reference bodies 16 of a board body 15 installed freely of vertical motion within a frame 10 and a clamp member 18. The frame 10 supports the sample without marring the flatness of the sample W by three height reference bodies 13 and a press means 22. Since the support of the sample W by the height reference body 13 and the press member 22 is the so-called three-point support, even if the frame 10 is distorted, it never mars the flatness of the sample W.</p>
申请公布号 JPH0897131(A) 申请公布日期 1996.04.12
申请号 JP19940258799 申请日期 1994.09.28
申请人 TOSHIBA MACH CO LTD 发明人 IWASE AKIRA
分类号 G03F7/20;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):H01L21/027 主分类号 G03F7/20
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