| 摘要 |
PURPOSE: To provide a liquid crystal display device and a manufacturing method for it, in which deterioration in a characteristic of a TFT element for controlling potential of a picture element electrode is not allowed when ultraviolet rays are radiated partially to an oriented film inside a picture element, deterioration in display quality in a sealing part of a substrate is not allowed when ultraviolet rays are radiated/not radiated to the oriented film, and an excellent visual angle characteristic is provided. CONSTITUTION: On an oriented film 3 formed on a transparent electrode 2 in a glass substrate 1, ultraviolet rays 6 with wavelength of 260nm or less are radiated to the inside of a TFT element and a picture element by using a photomask 4 in which an ultraviolet shielding film 5 is partially formed, and a low pretilt angle area 31 is formed inside the picture element. Ultraviolet rays are radiated to a sealing part in the substrate by using a photomask in which an ultraviolet shielding part is formed, and residual DC voltage generated remarkably in the seal part is lowered, and as a result, display quality is improved. The sealing part for the substrate is formed on the oriented film formed on the two substrates or over the outer circumference part of the oriented film, so that contamination of liquid crystal due to metal formed on the substrate or contaminant is prevented. |
