| 摘要 |
PURPOSE: To form a fine ceramic structure which has a pillar-shaped pattern with fine widths and, has a high aspect ratio by a method wherein, after a resin mold is filled with ceramic slurry and the ceramic slurry is solidified, the resin mold is removed. CONSTITUTION: The lithography process is applied to a conductive substrate 2 which is coated with resist 1 having an X-ray sensitivity through an X-ray lithography mask 3 which is composed of a support film and relatively thick absorbing units. After that, the substrate 1 is developed to form a resist structure 4. The obtained resist structure 4 is plated with nickel and a nickel mold 5 is obtained and then the resist structure 4 is removed. The obtained nickel mold 5 is used for making a resin mold 6. Then the resin mold 6 is filled with ceramic slurry 7 and the slurry 7 is dried and solidified. Finally, the resin mold 6 is removed and the solidified ceramic structure is baked to obtain a fine ceramic structure 8. |
