RESIST COMPOSITION, ITS PRODUCTION AND PATTERN FORMING METHOD USING SAME

摘要

PURPOSE: To provide a chemical amplification type resist compsn. having stable sensitivity and resolution even after storage over a long period of time and to provide a pattern forming method using the resist compsn. CONSTITUTION: This resist compsn. consists of m- or p-cresol novolak resin, a medium having such reactivity as to vary solubility to an aq. alkali soln. by a reaction with an acid catalyst, a compd. which generates an acid when irradiated with active radiation and an org. solvent. This resist compsn. giving a soln. of pH3-6 is applied to a substrate, irradiated with electron beams, baked and developed with an org. alkali developer to form a resist pattern. Even after storage at 22-24 deg.C over a long period of time, this resist compsn. gives a satisfactory resist pattern without increasing the quantity of radiation.