PHOTORESIST FILM

摘要

PURPOSE: To form a photoresist layer excellent in dispersion stability without causing defective dispersion of a phosphor and to improve the adhesion of the phosphor by incorporating a specified silane compd. and the phosphor into a photosensitive resin compsn. and laminating the resultant compsn. on a base film. CONSTITUTION: A phosphor and at least one kind of silane compd. selected from among epoxysilane, aminosilane and chloropropylsilane are incorporated into a photosensitive resin compsn. and the resultant compsn. is laminated on a base film to obtain the objective photoresist film. The phosphor is not especially limited but a phosphor obtd. by activating a matrix such as oxyhalide of a rare earth element with an activator is preferably used. Epoxysilane such as γ-glycidoxy-propyltrimethoxysilane or γ-glycidoxypropyltriethoxysilane is especially preferably used as the silane compd. Two or more kinds of such silane compds. may be used in combination.