Verfahren zur Herstellung von feinsten Metallfilmen und feinsten Metallbildern
摘要
A responsive film containing a responsible group occuring a chemical reaction by energy beam is formed on an insulated substrate, and energy beam is irradiated in a pattern, and part of the responsive group is selectively deactivated or activated, and only the remaining portion of the responsive group of the responsive film is coupled with a chemical substance containing metal in a later process, and an ultrafine pattern of metal film is formed.
申请公布号
DE3855073(D1)
申请公布日期
1996.04.11
申请号
DE19883855073
申请日期
1988.12.21
申请人
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., KADOMA, OSAKA, JP