| 发明名称 |
Photomask for use in etching patterns |
| 摘要 |
The invention provides a photomask having a support capable of transmitting light, a light-shielding pattern which shields said light, and a light absorbing member provided corresponding to said light shielding pattern. This photomask is of use in etching patterns, in particular for semiconductor devices. <IMAGE> <IMAGE> |
| 申请公布号 |
EP0706088(A1) |
申请公布日期 |
1996.04.10 |
| 申请号 |
EP19950203232 |
申请日期 |
1991.05.08 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
YAGI, TAKAYUKI;KOMATSU, TOSHIYUKI;SATO, YASUE;KAWATE, SHINICHI |
| 分类号 |
G03F1/68;G03F7/16;G03F7/20;H01L21/308;H01L21/311;H01L21/3213 |
主分类号 |
G03F1/68 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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