发明名称 MAGNETRON DEVICE FOR DEPOSITION OF THIN FILM ONTO SUBSTRATE BY SPRAYING AND METHOD FOR DEPOSITION
摘要 FIELD: application of coatings. SUBSTANCE: elongated anode design is offered which has many points to which electrons flow. Anode may be made of many wire brushes attached to metal rod. Use of anode in magnetron systems considerably reduces growing of dielectric material and improves uniformity of films, both, in chemically active (reactive) D.C.. spraying and also in nonreactive spraying. Besides, anode reduces overheating and increases service life of magnetron system subjected to reactive spraying of dielectric materials. One version of embodiment has magnetron system with cylindrical cathode and a pair of elongated anodes located parallel and at the same distance from cathode. EFFECT: applicable in deposition by spraying of uniform films of dielectric materials, including, silicon dioxide and silicon nitride.
申请公布号 RU94022474(A) 申请公布日期 1996.04.10
申请号 RU19940022474 申请日期 1994.06.24
申请人 DZE BOK GRUP 发明人 PITER A. SIK;RASSELL DZH. KHILL;DZHON L. VOSSEN;STEFEN K. SHUL'TS
分类号 C23C14/35;C23C14/56;H01J37/34;H01L21/203 主分类号 C23C14/35
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