| 摘要 |
<p>PURPOSE: To rapidly and effectively obtain a superclean space capable of preventing an increase of a contact angle by installing a stage for removing the harmful components to increase the contact angle and a stage for removing particulates in the hermetic space and placing a heating source in the hermetic space. CONSTITUTION: This cleaning method for preventing the increase in the contact angle of the surfaces of base materials or substrates includes a harmful component removing section A formed by using at least one kinds selected from active carbon, diatomaceous earth, silica gels 2, synthetic zeolite, high-polymer compds., glass materials or fluororesins for removing the harmful components 10 in gases within the hermetic space. Further, a particulate removing section B having a UV ray source 4 or radiation source and photon releasing materials 5 for releasing photons by irradiation with this ray source, electrodes 6 for electric fields and charge particulate capturing materials 7 for removing the particulates 11 in the gases is installed in the hermetic space. Further, a heat generating source 12 for generating gas circulating flow is installed in the hermetic space.</p> |
