发明名称 Method of making a high resistance drain junction resistor in a SRAM
摘要 An improved SRAM resistor structure having implanted therein ions of an material in the surface layer of a drain junction region juxtaposed to an overlying metal contact layer providing the benefits of high resistance, low energy consumption, a single ion implantation step in an easily controlled process while producing a precise resistance desired and a method of making the SRAM resistor structure.
申请公布号 US5506167(A) 申请公布日期 1996.04.09
申请号 US19950421000 申请日期 1995.04.13
申请人 UNITED MICROELECTRONICS CORP. 发明人 CHEN, HWI-HUANG;HONG, GARY
分类号 H01L27/11;(IPC1-7):H01L21/70 主分类号 H01L27/11
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