Multi-source reactive deposition process for the preparation of blue light emitting phosphor layers for AC TFEL devices

摘要

A multi-source reactive deposition process for preparing a phosphor layer for an AC TFEL device having the chemical formula MIIMIII2X4:RE, where MII is a group II metal taken from the group magnesium, calcium, strontium and barium, MIII is a group III metal taken from the group aluminum, gallium and indium, X is taken from the group sulfur and selenium, and RE comprises a rare earth activator dopant taken from the group cerium and europium is disclosed. The phosphor film is formed in crystalline form on a substrate heated to a temperature between 400 DEG and 800 DEG C. by depositing more than one deposition source chemical where at least one of the deposition source chemicals of the group II metal or the group III metal is a compound.