| 摘要 |
<p>A photosensitive rubber plate which is excellent in transparency and strength balance and can be rapidly washed after the exposure to light; and a photosensitive composition for use in preparing the rubber plate. The composition is prepared by kneading 20-65 parts by weight of an A-B-A block copolymer having a ratio of the butadiene block to the styrene block of 80.2/19.8, a vinyl bond content in the butadiene block of 30.2 % and a weight-average molecular weight of 13.4 x 104, 35-80 parts by weight of a hydrophilic phosphate copolymer prepared by the free-radical copolymerization of ethylene methacrylate phosphate and a monomer copolymerizable therewith, 5-300 parts by weight of a photopolymerizable, ethylenically unsaturated monomer, and 0.1-10 parts by weight of a photopolymerization initiator. The rubber plate is prepared by forming a layer of the above composition on the principal plane of a base layer.</p> |
