发明名称 |
Deposition process for transparent barrier layer |
摘要 |
Process of transparent barrier layers deposition, in which said layers of vaporised metal, obtained under vacuum by partial oxidation in a controlled way properly prepared on the chosen parameters. The partial oxidation is obtained by controlling the thickness of the layer deposited per passage, pression and composition of the of the atmosphere power and tension of the discharge which ignites plasma; the speed and temperature of the plastic film, etc. The invention can be applied in traditional deposition plants, particularly with aluminium films, for example like the roll-to-roll plant. |
申请公布号 |
EP0704547(A1) |
申请公布日期 |
1996.04.03 |
申请号 |
EP19950830275 |
申请日期 |
1995.06.30 |
申请人 |
CE.TE.V. CENTRO TECNOLOGIE DEL VUOTO |
发明人 |
MISIANO, CARLO;SIMONETTI, ENRICO;STAFFETTI, FRANCESCO |
分类号 |
B32B9/00;B32B15/04;C23C14/00;C23C14/20;C23C14/54;C23C14/56;C23C14/58 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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