Apparatus and method using low-voltage and/or low-current scanning probe lithography

摘要

An apparatus and method lithographically patterns an imaging layer using a predetermined pattern. The apparatus includes a cantilever having a tip attached thereto, which tip includes a conductive or semiconductive material. The apparatus also includes a scanning probe controller connected to the cantilever, which maintains the tip in contact with the imaging layer to be patterned. Substantially while the scanning probe controller maintains the tip in contact with the imaging layer, a voltage and/or current generator coupled to the tip selectively generates a voltage and/or current between the tip and the imaging layer to affect a physical change in the imaging layer based on the predetermined pattern. The physical change in the imaging layer can be exploited to fabricate integrated circuits, lithographic masks or micromechanical devices, for example. The scanning probe controller can also measure the topographical change in the imaging layer caused by the physical change using the same cantilever and tip.