Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber

摘要

A method and apparatus for removing extraneous deposits from particle control surfaces in a microwave plasma generating device. An annular magnetron plasma is formed in contact with a particle control surface having a shape which intersects 200-500 G lines of magnetic induction. The magnetron plasma is scanned across particle control surfaces on a horn and chuck by increasing the current to the main coil and/or mirror coil of the apparatus. As the magnetron plasma moves across the particle control surfaces, the plasma reacts with the extraneous deposits and etches the deposits off of the particle control surfaces.