| 摘要 |
<p>A protective mask (10) is provided for use with a pellicle (8) which is mounted to a photomask (30) during photolithography, with a light source being directed toward the photomask (30). The pellicle (8) includes a pellicle membrane (12) mounted to a pellicle frame (16) by a first adhesive layer (18) and with the pellicle frame (16) being mounted to the photomask (30) by a second adhesive layer (19). The protective mask (10) is fabricated of an opaque material and is positioned between the light source and the two adhesive layers (18, 19) to shield them from the light source so that the adhesive layers (18, 19) are not degraded by the light source.</p> |
