发明名称 LASER MACHINING
摘要 <p>PCT No. PCT/GB90/01071 Sec. 371 Date Jan. 14, 1992 Sec. 102(e) Date Jan. 14, 1992 PCT Filed Jul. 12, 1990 PCT Pub. No. WO91/01514 PCT Pub. Date Feb. 7, 1991.Apparatus for excimer laser image protection ablation of a target material comprising a projection lens system for projecting a mask pattern to be ablated onto the target, which lens system is telecentric towards the image (target) end of the projection path, and means for moving the target along the projection path whereby in use the size of the projected image areas to be ablated from the target is adjusted substantially without altering their relative portions of the target.</p>
申请公布号 EP0482051(B1) 申请公布日期 1996.03.27
申请号 EP19900910802 申请日期 1990.07.12
申请人 RAYCHEM LIMITED 发明人 SMITH, NICHOLAS, JOHN, GREGG
分类号 B23K26/06;B41M5/24;G03F7/20;H01L21/30;(IPC1-7):G03F7/20 主分类号 B23K26/06
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