发明名称 Mask and mask supporting mechanism.
摘要 A mask and a mask supporting mechanism are disclosed wherein the outside periphery of a mask frame of the mask, of rectangular shape, is supported at three supporting points which are at substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and theta directions. Two pressing mechanisms presses the mask frame at two points substantially opposed to two of the supporting points. As regards the positioning of the mask frame in Z direction, it is supported at three points on the bottom surface thereof. <IMAGE>
申请公布号 EP0677787(A3) 申请公布日期 1996.03.27
申请号 EP19950301151 申请日期 1995.02.22
申请人 CANON KABUSHIKI KAISHA 发明人 HARA, SHINICHI;MIZUSAWA, NOBUTOSHI;CHIBA, YUJI
分类号 G03F1/22;G03F7/20 主分类号 G03F1/22
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