发明名称 Programable element in barrier metal device and method
摘要 <p>An integrated circuit 10 has a programmable Zener diode with diffusion regions 18 and 16 and metal contacts 34 and 32. A barrier metal 30 is disposed between one contact 32 and the substrate 12; another contact region 44 has no barrier metal on its surface. A polysilicon layer 22 is self-aligned with surface regions 44 and diffusion region 18. A silicide layer 128 may be used on the polysilicon layer 22 and on surface region 44. <IMAGE></p>
申请公布号 EP0703624(A1) 申请公布日期 1996.03.27
申请号 EP19950401944 申请日期 1995.08.24
申请人 HARRIS CORPORATION 发明人 GASNER, JOHN T.;BEGLEY, PATRICK A.;PEARCE, LAWRENCE G.
分类号 H01L23/525;H01L27/102;(IPC1-7):H01L27/102 主分类号 H01L23/525
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