RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS

摘要

A radiation sensitive mixture useful for producing relief patterns contains (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also a group which on irradiation forms a strong acid, wherein the polymeric binder (a) contains from 5 to 40 mol % of monomer units having <IMG> groups in copolymerized or cocondensed form or the <IMG> groups introduced by polymer analogous reaction, with the proviso that the radical R contains from 5 to 9 carbon atoms.