| 摘要 |
PURPOSE: To make it possible to easily and exactly uniformizing the gap over the entire surface between a photomask and an object to be exposed, to correct the deflection of the photomask even if the photomask is formed to have a larger size and to realize patterning with a high throughput, low cost high accuracy. CONSTITUTION: This exposure device has the photomask 10 including an approximately plate-shape mask 4 with patterns drawn on it, a transparent plate 2 in parallel with the mask 4 and a frame-like body 3 arranged at the marginal circumference between the mask 4 and the transparent plate 2, means 6, 7, 8, 9, 11 which evacuate the space 5 composed by mask 4, the transparent plate 2 and the frame-like body 3, a base 14 which holds the object 13 for exposure arranged under the photomask 10 and a light source which irradiates the photomask 10 with light for exposing from above the photomask. |
