| 摘要 |
<p>PURPOSE: To provide a method for producing ceric oxide particles useful as an abradant for producing a semiconductor and an ultraviolet light absorbing material for plastics and glass. CONSTITUTION: An aqueous medium containing ceric hydroxide and a nitrate is adjusted to pH 8-11 by using an alkali substance and heated to 100-200 deg.C under pressure to provide a method for producing ceric oxide particles having 0.03-5μm particle diameters. An aqueous dispersion of crystalline ceric oxide particles having 0.03-5μm particle diameters is mixed with a quaternary ammonium ion [NR4 <+> ]/[CeO2 ] of 0.001-1 to a stabilized ceric oxide sol.</p> |
