| 摘要 |
<p>PURPOSE: To balance a black matrix forming material used in place of a conventional metal Cr-contg. material between high light shielding characteristics and high sensitivity by using specified components. CONSTITUTION: This photoresist resin compsn. contains a photopolymerizable monomer having vinyloxyalkyl groups represented by the formula, at least one kind of cationic photopolymn. initiator, a black pigment and a solvent as essential components. In the formula, each of R1 -R6 is H, halogen, alkyl such as methyl, ethyl or propyl, etc., Q is a group such as-OH and (n) is 0-20, preferably 0-10. In the case of n >20, the compd. is not preferably used because the solubility to the solvent is lowered.</p> |
