| 摘要 |
PURPOSE: To eliminate constricted parts from a resist pattern and, at the same time, to form a fine pattern. CONSTITUTION: In the method for forming a resist pattern to a part where a constricted part is formed by reflected light from the step section of a recessed part on a substrate to be worked, a resist pattern 14 is formed in the recessed part 12 on the substrate 11 and, at the same time, a dummy pattern 15 which intercepts reflected light to the resist pattern 14 from the step section 13 of the recessed part 12 is formed near the resist pattern 14. |
