发明名称 Method of growing silicon single crystals
摘要 The present invention provides a method of growing silicon single crystals by the Czochralski method, wherein the strength of a neck may be increased so as to delete the risk of severance thereof in a simple and easy way without the use of mechanically complex devices and thereby growing of a single crystal of a larger diameter and heavy weight is made practically possible. The method comprises the steps of: a single crystal being so grown from a seed crystal that the diameter of said single crystal gets gradually narrower until the length of a seed taper reaches 2.5 to 15 times the sectional size of the seed crystal; the diameter of a long near-cylindrical neck following the seed taper being so regulated that said diameter may be 0.09 to 0.9 times the sectional size of the seed crystal and 2.5 mm as the smallest in diameter; the spread of the diameter fluctuation of the neck being so restricted as to be less than 1 mm; and the length of the neck being so controlled as to be kept within the range of 200 mm to 600 mm.
申请公布号 US5501172(A) 申请公布日期 1996.03.26
申请号 US19950395837 申请日期 1995.02.28
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 MURAI, TOSHINARI;IINO, EIICHI;ARAI, HIDEO;FUSEGAWA, IZUMI;YAMAGISHI, HIROTOSHI
分类号 C30B15/00;(IPC1-7):C30B15/20 主分类号 C30B15/00
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