发明名称 |
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE AND DEVELOPING METHOD |
摘要 |
PURPOSE: To obtain a photosensitive compsn. excellent in adhesiveness to a substrate, ensuring printing resistance, having superior developability, developable with an alkaline aq. soln. not contg. a solvent without generating sludge in the developing bath and also having wide development latitude. CONSTITUTION: This photosensitive compsn. contains (a) a photosensitive high molecular compd. soluble or swellable in an aq. alkali soln. and having at least two photodimerizable unsatd. double bonds bonded to an arom. ring and at least one of sulfonate and sulfonic acid groups as a side chain and (b) diazo resin. |
申请公布号 |
JPH0876371(A) |
申请公布日期 |
1996.03.22 |
申请号 |
JP19940238584 |
申请日期 |
1994.09.07 |
申请人 |
KONICA CORP;MITSUBISHI CHEM CORP |
发明人 |
SUGI YASUHISA;MATSUMURA TOMOYUKI;MURATA MASAHISA;TSUJI SHIGEO |
分类号 |
G03F7/021;B41N3/03;G03F7/00;G03F7/027;G03F7/028;G03F7/30;(IPC1-7):G03F7/021 |
主分类号 |
G03F7/021 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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