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发明名称
APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH0878370(A)
申请公布日期
1996.03.22
申请号
JP19940207023
申请日期
1994.08.31
申请人
FUJITSU LTD
发明人
NIWAYAMA NOBUO
分类号
H01L21/304;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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