| 摘要 |
<p>PURPOSE: To provide a method of cleaning silicon carbide-made jigs used for making semiconductors. CONSTITUTION: Silicon carbide-made jigs having high-purity silicon carbide surface coats for making semiconductors (e.g. high temp. jigs, boats, susceptors etc. for chemical vapor deposition apparatus) are dipped in a hydrochlorate nitrate water soln. or nitrate hydrofluoride water soln. of 10vol.% or more for 30min or more. An ultrasonic wave applied at the same time will be more effective. This melts metal grains deposited on the surface of the jigs away from it, without damaging the silicon carbide coats whereby pin holes of the coats can be avoided and the repeat number of the reuse of the jigs can be greatly increased.</p> |
