| 摘要 |
PURPOSE: To provide such a mask for laser transfer processing that even when white spot defects are present in a patterned dielectric mask, the white spot defects can easily be corrected and process defects due to white defects can be prevented, and accurate transfer processing of the pattern can be performed. CONSTITUTION: This mask for laser transfer processing is used to transfer the pattern of the part where laser light 1 is transmitted to a material to be processed. This mask is produced by the following method. Two dielectric masks each consisting of light-transmitting substrate 3 (3') to transmit laser light 1 and dielectric multilayered film 2 (2') having a function to reflect the laser light 1 and also having opening pattern 14 (14') on the substrate, to partially transmit the laser light 1 are formed and these dielectric masks are disposed opposite each other with the dielectric multilayered films 2, 2' inside. After the opening patterns 14, 14' of the dielectric multilayered films faced each other are positioned, both dielectric masks are fixed. |
