发明名称 |
Hydrogen fluoride dopant source in the preparation of conductive coated substrate |
摘要 |
The present invention relates to the production of hydrogen fluoride dopant source gases for use in the production of conductive coatings on a substrate. More specifically, a fluorocarbon source gas is decomposed in the presence of oxygen to yield HF which is passed to a deposition furnace wherein a fluoride doped metal oxide coated glass substrate is prepared. |
申请公布号 |
AU3495995(A) |
申请公布日期 |
1996.03.22 |
申请号 |
AU19950034959 |
申请日期 |
1995.08.28 |
申请人 |
AMOCO/ENRON SOLAR |
发明人 |
KAI W JANSEN;BANJAMIN F FIESELMANN |
分类号 |
C03C17/245;C23C16/40;C23C16/448;H01B1/08 |
主分类号 |
C03C17/245 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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