| 摘要 |
In the illustrative disclosure, alignment of x-ray masks, with elements in the submicron range for x-ray lithographic replication, is carried out with the use of through-bores in the set of masks and in the substrates. A single point x-ray source may be used to produce widely offset parallel beams defining the bore alignment axes, or the bores may be formed with oblique axes converging at a point, so as to be usable with diverging x-ray beams from a point x-ray source. |
