| 摘要 |
<p>Niobium and tantalum compounds suitable for use as chemical vapor deposition source reagents, and a process for depositing niobium- or tantalum-containing coatings using the compounds. The compounds have the formula: M(OR1)x(R2-C(G)-CH-C(G)-R3)5-x wherein M is tantalum or niobium; G is oxygen or sulfur; and R?1, R2 and R3¿ are independently hydrocarbyl, fluoroalkyl or alkoxy groups. The niobium and tantalum reagent liquids in a reservoir (1) flow to a high precision liquid pump (3) through a valve (2). The pump then supplies the liquid solution to a hot vaporization zone (4) to flash vaporize the reagents. The gas-phase reagent then flows to a heated substrate (7) contained in a reactor (6) via a gas line (5) and is thermally decomposed to deposit an Nb- or Ta-containing coating on the substrate.</p> |
