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发明名称
Process for forming SiO2 film with polysiloxane/ozone reaction
摘要
申请公布号
EP0436185(B1)
申请公布日期
1996.03.20
申请号
EP19900124838
申请日期
1990.12.19
申请人
SEMICONDUCTOR PROCESS LABORATORY CO., LTD.;ALCAN- TECH CO., INC.;CANON SALES CO., INC.
发明人
MAEDA, KAZUO;TOKUMASU, NOBORU;NISHIMOTO, YUKO
分类号
C23C16/40;H01L21/316;(IPC1-7):H01L21/316
主分类号
C23C16/40
代理机构
代理人
主权项
地址
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