Frame-supported dustproof pellicle for photolithographic photomask.

摘要

Proposed is a frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of electronic fine devices such as LSIs, VLSIs and the like by mounting thereon. The inventive frame-supported pellicle is characterized in that the pellicle frame made from an anodization-treated aluminum-based alloy, to which a pellicle membrane is adhesively bonded on one of the end surfaces, is coated on the whole surface with a coating layer of an organic polymer such as an amorphous fluorine-containing polymer. The use of this inventive frame-supported pellicle can solve the heretofore unavoidable problem of dust particle deposition on the photomask even under dustproof protection with a pellicle, for which no remedial means has been proposed heretofore due to the unclear mechanism of such dust particle occurrence, by virtue of the smoothing effect of the anodized aluminum surface which otherwise is microscopically very rugged to be responsible for the formation of dust particles by rubbing with the surface of the holder case during transportation.