发明名称 PRODUCTION OF MODIFIED RESIN
摘要 PURPOSE: To obtain a modified resin which can give a molding well balanced between impact resistance and rigidity. CONSTITUTION: 100 pts.wt. metal salt of a copolymer of 70-99wt.% ethylene with 30-1wt.%α,β-unsaturated carboxylic acid, 0.1-50 pts.wt. heterocyclic- aromatic vinyl monomer containing a basic nitrogen atom as part of the aromatic ring, such as desirably 4-vinylpyridine or 2-vinylpyridine and 30-500 pts.wt. styrene monomer are subjected to aqueous suspension polymerization in the presence of a radical polymerization initiator.
申请公布号 JPH0873540(A) 申请公布日期 1996.03.19
申请号 JP19940217344 申请日期 1994.09.12
申请人 MITSUBISHI CHEM CORP 发明人 SHIBUYA SANEHIRO;YAMADA FUMIYOSHI;GOTO YUKITAKA
分类号 C08F2/18;C08F255/00;C08F255/02;(IPC1-7):C08F255/02 主分类号 C08F2/18
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