发明名称 |
AQUEOUS COLD SEAL RELEASE LACQUER |
摘要 |
An aqueous cold seal release varnish comprising the reaction product of a mixture comprising 30-50 parts of a polyamide block copolymer having an acid value of 30-45, 1-5 parts of an amide wax, 10-20 parts of at least one C1-C4 alkanol, 5-10 parts of an amine and 15-55 parts of water. The mixture is dissolved by heating at a temperature of 75.degree.-85.degree.C for a period of time of not more than 90 minutes to produce a varnish. An aqueous cold seal release lacquer (CSRL) is prepared from the varnish by mixing with a C1-C4 alkanol, water and a surfactant.
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申请公布号 |
CA2158144(A1) |
申请公布日期 |
1996.03.14 |
申请号 |
CA19952158144 |
申请日期 |
1995.09.12 |
申请人 |
SUN CHEMICAL CORPORATION |
发明人 |
CATENA, ROBERT J.;ADHIKARI, PRASAD K. |
分类号 |
C08G69/26;C08G69/28;C09D177/08;(IPC1-7):C08L77/06;C08L91/06 |
主分类号 |
C08G69/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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