发明名称 |
PRODUCTION OF HIGH PURITY PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE: To efficiently remove metallic impurities and halogen ions and to obtain a photosensitive resin compsn. excellent in sensitivity and preservation stability by treating a photosensitive resin compsn. or a component of the compsn. with a specified adsorbent. CONSTITUTION: A photosensitive resin compsn. or part or all of the constituents of the compsn. are dissolved in an org. solvent. and the resultant soln. is brought into contact with an adsorbent made of a compd. represented by the formula Al2 O3 .-nH2 O [where (n) is 0-5 and H2 O is water as a crystal forming component]. The photosensitive resin compsn. is not especially limited and any of positive and negative type photosensitive resin compsns. known as photoresists may be used. A photosensitive compd. and/or an alkali-soluble resin is dissolved in an org. solvent and brought into contact with the adsorbent. The concn. of the photosensitive compd. is usually 0 to 30wt.% and that of the alkali-soluble resin is usually 0 to 50wt.%. |
申请公布号 |
JPH0869112(A) |
申请公布日期 |
1996.03.12 |
申请号 |
JP19940205257 |
申请日期 |
1994.08.30 |
申请人 |
MITSUBISHI CHEM CORP |
发明人 |
NISHI MINEO;NAKANO KOJI |
分类号 |
G03F7/038;B01D15/00;G03F7/022;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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