| 发明名称 |
Apparatus and method for washing substrates |
| 摘要 |
A substrates-cleaning apparatus including a first unit provided with a scrubber for scrubbing a single side of a substrate, a second unit provided with a turning mechanism for turning the substrate upside down or vice versa, and a carrier robot for carrying the substrate between the first and the second unit.
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| 申请公布号 |
US5498294(A) |
申请公布日期 |
1996.03.12 |
| 申请号 |
US19930154964 |
申请日期 |
1993.11.19 |
| 申请人 |
TOKYO ELECTRON LIMITED;TOKYO ELECTRON KYUSHU LIMITED |
发明人 |
MATSUSHITA, MICHIAKI;YAMAHIRA, YUTAKA |
| 分类号 |
H01L21/304;H01L21/00;H01L21/677;H02P8/12;(IPC1-7):B08B7/04;B08B11/00 |
主分类号 |
H01L21/304 |
| 代理机构 |
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代理人 |
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| 主权项 |
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