| 摘要 |
PURPOSE: To improve sensitivity, residual film rate, the balance of resolution, heat resistance and dry etching resistance by consisting a resin composition of an alkali soluble resin, a compound causing crosslinking reaction by an acid and a compound generating hydrohalogenic acid by radiation. CONSTITUTION: This resin composition consists of an alkali soluble resin, a compound causing the crosslinking reaction by acid and a compound (acid generating agent by light), which generates hydrohalogenic acid by radiation and expressed by the formula. In the formula, each of X1 -X4 represents hydrogen atom, a lower alkyl group or a halogen atom and at least one of them is a halogen atom. The acid generatipg agent by light expressed by the formula is obtained by dissolving phenolphthalein or cresolphthalein in an alcohol solvent such as methanol, ethanol or a halogen solvent such as dichloromethane, carbon tetrachloride, adding halogen such as chlorine, bromine and allowing to react. |
