发明名称 PRODUCTION OF RETICLE AND SEMICONDUCTOR DEVICE
摘要 PURPOSE: To obtain a chip arranging constitution which does not impair the resolution performance and alignment accuracy over the entire surface of chips as far as possible, in a method for forming a reticle and a semiconductor device. CONSTITUTION: Respective chip regions are so arranged that the pattern regions 4 of the respectively very small widths within the plural chip regions in the reticle are formed so as to come nearest to the reticle center 5 of the reticle when the reticle has the pattern regions 4 of the extremely small width with respect to the pattern regions 3 of the ordinary width in the chip regions 2 in a part within the chip regions. The respective chip regions are so arranged that the regions 4 of a small margin for alignment in the plural chip regions 2 in the reticle are formed so as to come nearest to the reticle center 5 of the reticle when the reticle has the pattern regions 4 of the small margin for alignment with respect to the pattern regions of the ordinary margin for alignment in the chip regions 2 in a part within the chip regions. The semiconductor patterns are baked on a semiconductor substrate by using these reticles.
申请公布号 JPH0862825(A) 申请公布日期 1996.03.08
申请号 JP19940198427 申请日期 1994.08.23
申请人 FUJITSU LTD 发明人 SHIRAI HISATSUGU
分类号 G03F1/70;H01L21/027 主分类号 G03F1/70
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