PHASE EDGE TRIMLESS LITHOGRAPHY METHOD OF HIGH RESOLUTION

摘要

PROBLEM TO BE SOLVED: To minimize effects on a desired image, to eliminate all residual images generated by a mask and to improve resolution with a simple and inexpensive process by excessively exposing resist by using the mask, so as to compensate the positive bias of the mask. SOLUTION: A phase edge PSM is provided with chrome images on a mask biased for two constituting gratings (30). The resist is overexposed by using the mask, and a positive bias of the mask is compensated (31). Over exposure minimizes the effects on the desired image and eliminates all the residual images generated by the phase edge and the mask. Finally, the resist is processed by a normal method (32) and the exposure pattern of improved resolution and of process allowable degree is formed.