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发明名称
Verfahren zur selektiven Herstellung von III-V Halbleiterschichten.
摘要
申请公布号
DE3854407(T2)
申请公布日期
1996.03.07
申请号
DE19883854407T
申请日期
1988.03.28
申请人
CANON K.K., TOKIO/TOKYO, JP
发明人
TOKUNAGA, HIROYUKI, KAWASAKI-SHI KANAGAWA-KEN, JP;YONEHARA, TAKAO, ATSUGI-SHI KANAGAWA-KEN, JP
分类号
C30B25/18;C30B29/40;H01L21/20;H01L21/205;H01L21/84;(IPC1-7):H01L21/203;C30B25/04;C23C16/04
主分类号
C30B25/18
代理机构
代理人
主权项
地址
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