发明名称 |
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RUBBER PLATE AND PROCESS FOR PRODUCING THE PLATE, AND FLEXOGRAPHIC PLATE AND PROCESS FOR PRODUCING THE PLATE |
摘要 |
<p>A photosensitive composition comprising 35-80 parts by weight of a hydrophilic phosphate copolymer (A) prepared by copolymerizing a monomer mixture composed of 5-30 wt.% of an unsaturated phosphate monomer (a), 40-90 wt.% of a conjugated diene monomer (b) and 0-50 wt.% of a monoolefin monomer (c) other than the component (a), 65-20 parts by weight of a thermoplastic elastomer (B) (the total weight of components (A) and (B) being 100 parts by weight), 5-300 parts by weight of a photopolymerizable ethylenic monomer (C), and 0.1-10 parts by weight of a photopolymerization initiator. This composition is useful for producing photosensitive rubber plates and flexographic plates.</p> |
申请公布号 |
EP0699961(A1) |
申请公布日期 |
1996.03.06 |
申请号 |
EP19940910588 |
申请日期 |
1994.03.31 |
申请人 |
NIPPON ZEON CO., LTD. |
发明人 |
SUZUKI, TAKAO;SAKURAI, FUSAYOSHI;UENO, HARUO;KONISHI, ICHIRO;USUI, TATSUO |
分类号 |
G03F7/033;(IPC1-7):G03F7/027 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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