发明名称 PRODUCTION OF HIGH-PURITY METALLIC MATERIAL, PRODUCTION OF SPUTTERING TARGET AND FORMATION OF WIRING NET
摘要 PURPOSE: To easily produce a high-purity metallic material with good reproducibility by refining a crude metallic material consisting essentially of one kind of metal selected from among Ti, Zr and Hf by the iodide decomposition method and melting the refined metal with an electron beam in a high vacuum. CONSTITUTION: A crude metallic material consisting essentially of one kind among Ti, Zr and Hf, e.g. a crude Ti material, is charged into a reaction vessel 1 along with an iodine material and heated to 1100-1500 deg.C by energizing a filament 5 to keep the inside of the vessel 1 at 100-250 deg.C. Consequently, the crude Ti material reacts with the iodine material to form TiI4 which is again decomposed into Ti and iodine, and the Ti alone is deposited on the filament 5. The Ti material thus obtained is melted with an electron beam in a high vacuum of <=5×10<-5> mbar to remove AN, Na, K, etc. A high-purity metallic material contg. <=100ppm each of Fe, Nl and Cr and <=10ppm Al is obtained in this way.
申请公布号 JPH0860350(A) 申请公布日期 1996.03.05
申请号 JP19950185142 申请日期 1995.07.21
申请人 TOSHIBA CORP 发明人 ISHIGAMI TAKASHI;KAWAI MITSUO;OBATA MINORU;SATO MICHIO;YAMANOBE TAKASHI;MAKI TOSHIHIRO;ANDO SHIGERU;YAGI NORIAKI
分类号 C22B34/12;C22B34/14;C22C1/02;C22C14/00;C22C16/00;C22C28/00;C23C14/34;H01L21/203;H01L21/285;(IPC1-7):C23C14/34 主分类号 C22B34/12
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